1.7 MV Tandetron Accelerator
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This accelerator has the "tandem" configuration where negative ions generated by an ion source are first accelerated to the high voltage terminal and subsequently, the negative ion are converted to positive ions, while passing through a stripper canal filled with nitrogen gas.
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150 kV Gaseous Ion Implanter
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This accelerator with RF ion source is configured from Sames J-15 neutron generator. Interaction of gaseous ions with materials are studied in this accelerator.
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400 keV Accelerator
brief
Photoluminescence Spectroscopy
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Excited with UV [He-Cd (325 nm)] this setup collects light in the backscattered configuration. Dispersion is done with three sets of gratings in a double subtractive triple monochromator (Juvin-Yvon T64000 spectrograph). PL spectra can be recorded for a wide range of 300-1500 nm.
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Thin Film Coating Unit
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Thin film for contact formation or over layer can be grown using restive heating with 100 Amp (max.) at 10-6 Torr pressure. LN2 trap is provided for clean vacuum. Film can be coated at substrate temperatures of 77K-775K.
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